CAI Técnicas Físicas - Unidad de Implantación Iónica
Fac. CC. Físicas, módulo central, sótano.
Systems belonging to the Unidad de Implantación Iónica of the CAI de Técnicas Físicas
- Ion Beam Services refurbished ion implanter. 200 keV maximum energy. Most elements available, substrates up to 4'. Possibility of implantation in the 77-670 K range.
- e-beam evaporator. Combines an e-beam gun with a Joule evaporation, enabling 2 materials multilayers.
- Two thermal annealing furnaces (ADDAX-RM and Modular Process Technology). Heating rates up to 150ºC/s and temperatures up to 1300 ºC and 1100ºC.
- Soak annealing furnace for temperatures up to 700 ºC and controlled atmosphere.